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- home > Supply > Hollow Fiber Membrane degassing liquid-gas separation membrane degassing membrane vapor separation
Information Name: | Hollow Fiber Membrane degassing liquid-gas separation membrane degassing membrane vapor separation |
Published: | 2014-12-27 |
Validity: | 300 |
Specifications: | |
Quantity: | 500.00 |
Price Description: | |
Detailed Product Description: | Brand: UF Item: HT-TQM6040 Material: Plastic Membrane Membrane Introduction HT-T series degassing membrane is to control the liquid degassing, gas hollow fiber membrane module. Unique hollow fiber having a dense skin layer of a liquid impermeable, permeable to gases only, suitable for use in degassing liquids, gas. The main purpose · ultrapure oxygen, in addition to bubble handle PROGRAM decarbonation · boiler water deoxygenation · ultrasonic cleaning machine water according to different processing flow, operating pressure and other conditions of use, size, etc. to select the most suitable products. Model processing flow (L / h) membrane area (m2) Pressure (MPa) HT-T4040 1000 about 15 0.10 HT-T6040 2500 about 35 0.10 excellent durability HT-T series degassing membrane, a dense skin and internal The support layer is completely integrated. Not made of composite structures. This integrated structure is not only superior performance, durability is also good. By using hollow fiber membranes having a dense skin layer degassing, the condensed water can be produced at a low level. Membrane filtration membranes with different filtration membrane filtration over a certain size of particles, water directly through the membrane pores. Membrane through only gas, not through the liquid. Characteristic performance parameters ☆, membrane outer diameter: 350 ~ 360μm ☆, film inside diameter: 250 ~ 260μm ☆, intima-media thickness: 50μm ☆, pore size: 0.01 ~ 0.2μm ☆, permeability:> 7.0 × 10-2 (cm3 / cm2 · S · cmHg) ☆, porosity: 45 ~ 65% ☆, water flux: 1T / H / support (0.10Mpa / 25 ℃); 2.5T / H / support (0.10Mpa / 25 ℃); ☆ single branch area: 15m2 / 35m2 ☆, Model: HT-T4040 / / HT-T6020 ☆, the removal rate: ≥85% (single-stage) ☆, the work of running the voltage across ≥0.1Mpa ☆, film material: imported film wire material ☆, corresponding to the mass of ultra-pure water supply device ☆, due to the use of nitrogen can be achieved cost-efficient method of manufacturing operation (for degassing vacuum pump is required to move the power source as a gas.): no All solvents and using other added substances operating conditions: Single-stage membrane module: degassing rate: 85% two membrane modules connected in series, the degassing rate: 95%, the source of water to remove free chlorine, ozone, and oxidation better than Membrane material component. ? For urban water supply, the water temperature is <30 degrees Celsius, the free chlorine <1ppm. Membrane is placed upright seat and directionality: · The water must enter on the next, if the series, before a membrane effluent must enter from the bottom of the next membrane. · Located below the outlet must be higher than the water ring vacuum pump inlet, so that water can flow to the water ring vacuum pump. As shown horizontally: · only in vacuum mode, the air inlet port to be high vacuum pump, and water may guide below. · Gas port should be shown with each other to 180 °. Outlet port must be above the water ring pump inlet, so the water can flow to the water ring vacuum pump. Water Water is subject to the requirements of recommendation 5 micron pre-filter. Filtration accuracy depends on the composition of the water required to make adjustments when necessary. If there are particles in the feed water adsorption or condensation may recommend more stringent filtering accuracy. · To prevent the growth of bacteria, can be filled during the shutdown using fungicides (fungicides source water to remove free chlorine, ozone and other strong oxidizing substances in membrane degassing), fungicides level monitoring to ensure effectiveness. Degassing process Membrane technology is a new gas / liquid membrane separation process, through vacuum, vacuum O2 + N2 and other methods can make the water removal rate of greater than 90% / 96%, by blowing, Methods such as pumping + inflatable water CO2 removal rate can be greater than 85% / 98%, users can further enhance the effect by degassing membrane degassing series and other methods. (1) off the liquid carbon dioxide RO reverse osmosis desalination and electricity (EDI) or continuous electric desalting (CDI) system water must reduce carbon dioxide (CO2) in the water content. High electrical conductivity desalting (EDI) or continuous electric desalting (CDI) water will reduce the water resistivity values. CO2 dissolved in water is the main cause of high conductivity. Membrane provides a clean, no maintenance and no removal of carbon dioxide CO2 from the water method does not require chemical additives to adjust the PH value of maintenance, removal rate of 99.9%. If the former EDI or CDI to remove carbon dioxide, then it will be able to make electric desalting (EDI) or continuous electric desalting (CDI) output higher quality of product water, reverse osmosis + EDI enables original effluent from resistivity The original 1.0 trillion to 18 trillion. When the water of dissolved carbon dioxide removal, EDI / CDI silicon and boron removal will also improve, so that the reverse osmosis membrane degassing + water to completely replace the conventional reverse osmosis water desalination as electricity ( EDI) of water becomes possible. (2) off the liquid oxygen degassing membrane is widely used oxygen from water and other liquid oxygen. Oxygen O2 have a negative impact on many processes; oxygen corrosion and oxidation of the material will be. In the electric power and other industrial fields, if not for degassing, pipes, boilers and the device is vulnerable to corrosion. Membrane provides a chemical added without degassing tower and a large easy to operate, modular water deoxy method. Also provides a step can only achieve simultaneous removal of oxygen (O2) and carbon dioxide, CO2, and nitrogen control benefits. Flexible applications in the semiconductor field in the semiconductor and flat film industry, high oxygen content will result in lower yields. In the field of microelectronics, degassing membrane to meet the dissolved oxygen index <1ppb and provide performance guarantees. Completely replace the degassing tower provides a perfect solution. Common Applications - removing the solution of oxygen (less than 1 ppb) - removing the solution of carbon dioxide (less than 1 ppm) - removing the solution in nitrogen - controlling gas humidity - remove liquid microbubbles (eg: photoresist ﹑ color ink ﹑ emulsion) - to the solution of adding hydrogen in order to control the amount of dissolved hydrogen - added to the solution in a nitrogen gas to control the amount of nitrogen dissolved - in addition to the solution of carbon dioxide gas |
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Copyright © GuangDong ICP No. 10089450, Hangzhou Haotian Membrane Technology Co., Ltd. All rights reserved.
Technical support: ShenZhen AllWays Technology Development Co., Ltd.
AllSources Network's Disclaimer: The legitimacy of the enterprise information does not undertake any guarantee responsibility
You are the 19220 visitor
Copyright © GuangDong ICP No. 10089450, Hangzhou Haotian Membrane Technology Co., Ltd. All rights reserved.
Technical support: ShenZhen AllWays Technology Development Co., Ltd.
AllSources Network's Disclaimer: The legitimacy of the enterprise information does not undertake any guarantee responsibility